Products
Argon gas for electronic industry (Ar)
|
Item |
Technical Property |
|
| Argon (Ar) purity (volume fraction)/10-2≥ |
99.9999 |
99.9992 |
| Hydrogen (H2) content (volume fraction)/10-6≤ |
0.1 |
1 |
| Nitrogen (N2) content (volume fraction)/10-6≤ |
0.5 |
5 |
| Oxygen (O2) content (volume fraction)/10-6≤ |
0.2 |
0.5 |
| Total content of carbon monoxide (CO) and carbon dioxide (CO2),
(volume fraction)/10-6≤ |
Carbon monoxide: 0.1 Carbon dioxide: 0.1 |
0.5 |
| Total hydrocarbon (calculated by methane) content (volume fraction)/10-6≤ |
0.1 |
0.5 |
| Water (H2O) content (volume fraction)/10-6≤ |
0.2 |
0.5 |
| Total impurity content (volume fraction)/10-6≤ |
1 |
8 |
| Grain |
Agreed by the Supplier and the Demander |
Agreed by the Supplier and the Demander |
| Note: The water content of liquid argon shall be measured after gasification | ||
Application field: mainly used for purging, protection and pressurization of the system. It can also be used in chemical vapor deposition, sputtering, plasma and active ion etchant, annealing and other different processes, as well as in electronic special mixed gas.
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